Small particles detection and analysis
Collaborators:
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Dick Brundle; Advanced Materials/Sematech
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D. Dunham, T. Droubay, J. Denlinger, B. P. Tonner; UW-M
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Aline Cossy, Javier Diaz, G. Castro, J. Stohr; IBM-Almaden
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Tony Warwick; LBNL
Sub-micron scale particles are a major problem for the next generation
of integrated circuit microprocessors. Particles of this size can cause
substantial loss of yield in the IC wafer, raising the costs of producing
working devices and limiting the economically achievable smallest feature
size. Small particles, around 0.1 micron in size, are very difficult to
find and analyze. We are using photoemission microscopy to do both of these
tasks. One advantage of this technique is that the spectra tell you the
chemical state of the particle, which aids in tracking down the contamination
source.
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(last updated 7 Feb 96 by B. Tonner)